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Surface Technology

Plasma Cleaning Systems

Atmospheric pressure and low-pressure plasma cleaning systems for surface activation, oxide removal, degreasing, and pre-treatment of PCBs, semiconductor wafers, metals, polymers, and composites.

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Atmospheric Pressure Plasma Cleaning System

Atmospheric Pressure Plasma Cleaner

Inline and batch surface cleaning & activation without vacuum

The atmospheric pressure plasma cleaner generates a stable plasma jet (or diffuse discharge) at ambient pressure using air, nitrogen, argon, or oxygen as the working gas. It removes organic contamination, oxides, and surface passivation layers while simultaneously activating surfaces for improved adhesion of adhesives, coatings, and underfills — without the need for vacuum pumping equipment.

Plasma TypeDBD / Jet Plasma
Power200W – 2000W
Frequency20 kHz – 60 kHz
GasAir / N₂ / Ar / O₂
Gas Flow5 – 50 L/min
Treat Width5 mm – 300 mm
SpeedUp to 50 m/min
IntegrationRobot / Conveyor / SMT
ControlPLC + HMI
  • No vacuum required
  • Inline production integration
  • Fast throughput processing
  • Selective area treatment
  • Robot arm mountable head
  • Multiple nozzle configurations
  • Dry, chemical-free process
  • UV ozone option available
Compatible Gases:
AirN₂ (Nitrogen)O₂ (Oxygen)Ar (Argon)He (Helium)

Low Pressure Plasma Cleaning System

Low Pressure / Vacuum Plasma Cleaner

Batch processing under controlled vacuum for deep surface treatment

The low pressure plasma cleaning system operates under vacuum (0.1 – 100 Pa) with RF or microwave power excitation. Under reduced pressure, the plasma mean free path is extended — enabling thorough surface cleaning of complex 3D geometries, recesses and vias. The system processes batches of PCBs, wafers, MEMS, medical devices and precision components with superior cleaning uniformity and process repeatability.

Chamber20L / 50L / 100L+
Pressure0.1 – 100 Pa
RF Frequency13.56 MHz
RF Power100W – 1000W
Pump Down< 5 min to 1 Pa
Gas FlowMFC-controlled
Uniformity±5% across load
ElectrodeAluminium / SS
Recipe100+ stored programs
  • Full 360° surface treatment
  • High-aspect ratio cleaning
  • Mass flow controller gas mixing
  • Precise process repeatability
  • Quartz or metal chamber options
  • Auto pressure regulation
  • RF impedance matching
  • 21 CFR Part 11 data logging
Process Gases:
O₂ArH₂ / Forming GasCF₄N₂SF₆

Atmospheric vs Low Pressure — At a Glance

Atmospheric Pressure

  • No vacuum chamber needed
  • Fast inline processing
  • Robot & conveyor integration
  • Lower capital investment
  • Best for flat surfaces & spot treatment
  • Immediate substrate handling after process

Low Pressure

  • Superior uniformity across batch
  • Deep cleaning of vias and recesses
  • Ideal for wafers and MEMS
  • Precise gas mixture control
  • Reactive ion etching (RIE) capability
  • FDA/ISO compliant data logging

Application Areas

IndustryApplicationRecommended Type
PCB / ElectronicsPre-soldering activation, flux removal, underfill prepAtmospheric or Low Pressure
SemiconductorWafer cleaning, photoresist strip, native oxide removalLow Pressure
AutomotiveBonding surface prep, gasket & adhesive activationAtmospheric
Medical DevicesImplant sterilisation, hydrophilisation, biocompatibilityLow Pressure
AerospaceComposite surface prep, adhesive bonding pre-treatmentLow Pressure
OpticsLens cleaning, anti-reflection coating prepLow Pressure
MEMSRelease layer removal, hydrophobic/hydrophilic switchingLow Pressure
Plastics / PolymersSurface energy increase for printing, painting, bondingAtmospheric

Need Plasma Cleaning?

Our engineers will recommend the right plasma system — atmospheric or vacuum — for your substrate and throughput requirements.

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Contact Us
+91 73758 46650 info@creationengineerings.com
Jaipur, Rajasthan, India

Furnaces & Lab Thermal Equipment

High-temperature furnaces, ultra-low freezers, thermostatic baths and rapid temperature cycling systems for R&D, materials testing and quality laboratories.

High-Temperature Furnace Range

Professional furnaces for heat treatment, sintering, annealing and materials research up to 1800 degrees C.

Vacuum Furnace
Vacuum Furnace

Vacuum Tube Furnace

High-vacuum furnaces for sintering, brazing and heat treatment of metals and ceramics under controlled atmosphere. Eliminates oxidation for pristine surface quality.

Up to 1800 CVacuum / Inert GasPID Control
Rotary Tube Furnace
Rotary Furnace

Rotary Tube Furnace

Rotating tube furnace for continuous or batch processing of powder materials. Ideal for calcination, reduction and chemical vapour reactions requiring uniform heat.

Up to 1200 CVariable RotationGas Atmosphere
Heat Treatment Furnace
Heat Treatment

Heat Treatment Furnace

Box-type and chamber furnaces for annealing, hardening, tempering and normalising steel and non-ferrous alloys with precision temperature uniformity.

Up to 1300 C+/-2 C UniformityProgrammable Ramp
Spectroscopy Furnace
Analytical Furnace

Spectroscopy Sample Furnace

Compact tube furnace for sample preparation in XRF, ICP and spectroscopy analysis. Controlled atmosphere options for sample decomposition and digestion.

Up to 1100 CCompactLab Grade

Low Temperature & Thermal Control

Ultra-low freezers, thermostatic baths, ovens and lab refrigerators for temperature-sensitive research and storage.

Ultra Low Freezer
Deep Freeze Storage

Ultra Low Temperature Freezer

Ultra-low freezers reaching -86 degrees C for long-term storage of biological samples, vaccines, reagents and chemical compounds requiring extreme cold chain preservation.

-86 CUpright / ChestAlarm System
Thermostatic Bath
Thermal Control

Thermostatic Circulating Bath

Precision thermostatic baths for viscosity testing, calibration, and chemical reactions requiring stable temperature environments from -20 to +150 degrees C.

-20 to +150 C+/-0.1 C StabilityCirculating
Lab Refrigerator
Cold Storage

Laboratory Refrigerator

Explosion-proof and standard lab refrigerators for samples, chemicals and biological materials with uniform temperature distribution and digital display.

+2 to +8 CExplosion-ProofSpark-Free
Rapid Temperature Cyclic System
Rapid Thermal Cycling

Rapid Temperature Cyclic System

Ultra-fast thermal cycling chambers for semiconductor testing, medical device qualification and accelerated life testing with ramp rates exceeding 40 C/min.

-70 to +180 C>40 C/min RampJESD22-A104

Equipment Summary

EquipmentTemperature RangeAtmosphereApplication
Vacuum Tube FurnaceRT to 1800 CVacuum / Inert GasSintering, Brazing
Rotary Tube FurnaceRT to 1200 CAir / GasCalcination, Powder
Heat Treatment FurnaceRT to 1300 CAir / InertAnnealing, Hardening
Rapid Cyclic System-70 to +180 CAirThermal Shock Cycling
Ultra Low Freezer-86 CSample Storage
Thermostatic Bath-20 to +150 CViscosity, Calibration

Enquire About Furnaces & Thermal Systems

Share your temperature range, atmosphere and application - we will configure the right system.

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